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• Posted by Eamonn Fearon on 11th November 2002 Pulsed Laser Deposition is a term usually used to describe the process of depositing thin films onto a suitable target substrate by using a laser ablation technique. In this process a pulsed laser is used to vapourise a small amount of the donor material (usually a ceramic)such that the plume of vapourised material ejected from the donor lands upon the target material, coating it with a thin film. The amount of vapourised material is a function of the pulse parameters employed. As a result the thickness and coverage area of the deposited film can be accurately controlled